Enhancement/depletion phemt device and manufacturing method thereof

ABSTRACT

An embodiment of the present invention concerns a layered epitaxial structure for enhancement/depletion PHEMT devices, an enhancement/depletion PHEMT device and a method for manufacturing an enhancement/depletion PHEMT device that finds advantageous, but not exclusive, application in the manufacturing of integrated circuits operating at millimetre-wave and microwave frequencies.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims priority to Italian Application No. TO2001A000713 filed on 1 Aug. 2011, the contents of which are incorporated herein, in their entirety, by this reference.

TECHNICAL FIELD

Embodiments of the present invention relates, in general, to enhancement/depletion Pseudomorphic High Electron Mobility Transistors (PHEMTs) and, in particular, to an enhancement/depletion PHEMT device and a method for manufacturing enhancement/depletion PHEMT devices that finds advantageous, but not exclusive, application in the production of integrated circuits operating at millimetre-wave and microwave frequencies.

BACKGROUND

As is known, Pseudomorphic High Electron Mobility Transistors (PHEMTs) are widely used in integrated circuits operating at millimetre-wave and microwave frequencies, such as the so-called Monolithic Microwave Integrated Circuits (MMICs).

In particular, PHEMTs are widely exploited in various types of system, such as radio communication systems and radar systems.

In detail, PHEMTs have found wide utilization over the years because they provide high Radio Frequency gain (RF gain), high Power Added Efficiency (PAE) and a low Noise Figure (NF).

SUMMARY

The applicant, in consideration of the excellent properties of PHEMTs that, as previously mentioned, have given rise to extensive usage thereof in various types of systems over the years, has carried out an in-depth study on currently-known enhancement/depletion PHEMT devices.

In particular, the applicant has carried out an exhaustive analysis regarding the characteristics of the enhancement/depletion PHEMT devices described in United States patent applications US 2006/0027840 and US 2006/0208279, in European patent application EP 0371686 and in U.S. Pat. Nos. 6,670,652, 6,703,638 and 7,361,536.

On the basis of the results of said analysis, the applicant felt, thence, the need to develop:

-   -   an innovative enhancement/depletion PHEMT device having superior         properties than currently known enhancement/depletion PHEMT         devices, in particular the enhancement/depletion PHEMT devices         described in United States patent applications US 2006/0027840         and US 2006/0208279, in European patent application EP 0371686         and in U.S. Pat. Nos. 6,670,652, 6,703,638 and 7,361,536; and     -   an innovative method for manufacturing enhancement/depletion         PHEMT devices.

Therefore, the object of one or more embodiments of the present invention is that of providing an enhancement/depletion PHEMT device and a method of manufacturing an enhancement/depletion PHEMT device.

This object is achieved by one or more embodiments of the present invention in that the latter relates to a layered epitaxial structure for enhancement/depletion PHEMT devices, to an enhancement/depletion PHEMT device and to a method for manufacturing an enhancement/depletion PHEMT device, according to that defined in the appended claims.

In particular, the layered epitaxial structure for PHEMT devices comprises:

-   -   a superlattice and buffer layer;     -   an undoped back-barrier layer formed on the superlattice and         buffer layer and made of aluminium gallium arsenide (AlGaAs);     -   a doped back delta doping layer formed on the back-barrier         layer;     -   an undoped back-spacer layer formed on the back delta doping         layer and made of aluminium gallium arsenide (AlGaAs);     -   an undoped channel layer formed on the back-spacer layer and         made of indium gallium arsenide (InGaAs);     -   an undoped spacer layer formed on the channel layer and made of         aluminium gallium arsenide (AlGaAs);     -   a delta doping layer formed on the spacer layer;     -   an undoped enhancement barrier layer formed on the delta doping         layer;     -   a doped first etch stopper layer formed on the enhancement         barrier layer and made of aluminium arsenide (AlAs);     -   a doped first depletion barrier layer formed on the first etch         stopper layer;     -   an undoped second depletion barrier layer formed on the first         depletion barrier layer;     -   a doped second etch stopper layer formed on the second depletion         barrier layer and made of aluminium arsenide (AlAs);     -   a first cap layer doped with n-type doping, formed on the second         etch stopper layer and made of gallium arsenide (GaAs);     -   an undoped second cap layer formed on the first cap layer and         made of gallium arsenide (GaAs);     -   a third etch stopper layer doped with n-type doping, formed on         the second cap layer and made of aluminium arsenide (AlAs); and     -   an ohmic layer doped with n-type doping, formed on the third         etch stopper layer and made of gallium arsenide (GaAs).

Furthermore, the enhancement/depletion PHEMT device according to an embodiment of the present invention comprises:

-   -   the above-stated layered epitaxial structure;     -   a first region comprising         -   a first recess vertically formed through the ohmic layer and             the third etch stopper layer so as to expose a first upper             surface of the second cap layer,         -   a second recess that is narrower than the first recess and             which vertically extends from the first recess through the             second cap layer, the first cap layer and the second etch             stopper layer so as to expose a first upper surface of the             second depletion barrier layer, and         -   a third recess that is narrower than the second recess and             which vertically extends from the second recess through the             second depletion barrier layer, the first depletion barrier             layer and the first etch stopper layer so as to expose an             upper surface of the enhancement barrier layer defining a             first Schottky contact region;     -   a second region laterally spaced apart, and electrically         insulated, from said first region and comprising         -   a fourth recess vertically formed through the ohmic layer             and the third etch stopper layer so as to expose a second             upper surface of the second cap layer, and         -   a fifth recess that is narrower than the fourth recess and             which vertically extends from the fourth recess through the             second cap layer, the first cap layer and the second etch             stopper layer so as to expose a second upper surface of the             second depletion barrier layer defining a second Schottky             contact region;     -   an enhancement transistor formed in first region and comprising         -   first source and drain electrodes formed on, and in ohmic             contact with, said ohmic layer in the first region             externally to the first recess, and         -   a first gate electrode formed in the third recess in             Schottky contact with the upper surface of the enhancement             barrier layer defining the first Schottky contact region and             extending vertically from said first Schottky contact region             through the third, second and first recesses so as to             protrude from said first recess; and     -   a depletion transistor formed in second region and comprising         -   second source and drain electrodes formed on, and in ohmic             contact with, said ohmic layer in the second region             externally to the fourth recess, and         -   a second gate electrode formed in the fifth recess in             Schottky contact with the second upper surface of the second             depletion barrier layer defining the second Schottky contact             region and extending vertically from said second Schottky             contact region through the fifth and fourth recesses so as             to protrude from said fourth recess.

BRIEF DESCRIPTION OF THE DRAWINGS

For a better understanding of the present invention, some preferred embodiments, provided by way of non-limitative example, will now be illustrated with reference to the attached drawings (not to scale), where:

FIGS. 1-6 are schematic section views that illustrate successive manufacturing steps of a first enhancement/depletion PHEMT device according to a first preferred embodiment of the present invention; and

FIGS. 7 and 8 are schematic section views of a second enhancement/depletion PHEMT device according to a second preferred embodiment of the present invention.

DETAILED DESCRIPTION

Embodiments of the present invention will now be described in detail with reference to the attached Figures to enable an expert in the field to embody it and use it. Various modifications to the described embodiments will be immediately obvious to experts in the field, and the generic principles described herein can be applied to other embodiments and applications without leaving the scope of protection of the present invention, as defined in the appended claims. Therefore, the present invention should not be considered as limited to the embodiments described and illustrated herein, but be conceded the broadest scope of protection consistent with the principles and characteristics described and claimed herein.

FIGS. 1-6 are schematic section views that illustrate successive manufacturing steps of a first enhancement/depletion PHEMT device according to a first preferred embodiment of the present invention, said first enhancement/depletion PHEMT device being indicated as a whole in said FIGS. 1-6 by reference numeral 1.

In particular, with reference to FIG. 1, the first enhancement/depletion PHEMT device 1 comprises a layered epitaxial structure that includes:

-   -   a superlattice and buffer layer 11, the function of which mainly         lies in enabling the growth of the layered epitaxial structure         described herein and shown in FIG. 1 on semi-insulating gallium         arsenide (GaAs) substrates, ensuring effective confinement of         electrons in a channel made of indium gallium arsenide (InGaAs)         (said InGaAs channel being indicated in FIG. 1 by reference         numeral 15 and described in detail below) and avoiding the         formation of undesired conductive channels in the layers beneath         the indium gallium arsenide (InGaAs) channel; one possible         embodiment of said superlattice and buffer layer 11, which in         any case envisages multiple alternative solutions, is that of         alternating undoped layers of aluminium arsenide (AlAs) and         gallium arsenide (GaAs) with thicknesses of around a few tens of         nanometres (nm), repeating the growth of these layers roughly         ten times; however, it is still possible to also make use of         solutions that use layers of aluminium gallium arsenide (AlGaAs)         instead of the layers of aluminium arsenide (AlAS) or, in any         case, other epitaxial solutions used to eliminate the formation         of parasitic electrically conductive channels;     -   an undoped back-barrier layer 12, formed on the superlattice and         buffer layer 11 and made of aluminium gallium arsenide (AlGaAs),         said back-barrier layer 12 preferably having a weight         concentration of aluminium (Al) within the range of 18%-28% and         a thickness greater than 0 nm and less than or equal to 50 nm;     -   a doped back delta doping layer 13, formed on the back-barrier         layer 12, said back delta doping layer 13 having a doping level         greater than 0 and less than or equal to 4e¹²;     -   an undoped back-spacer layer 14, formed on the back delta doping         layer 13 and made of aluminium gallium arsenide (AlGaAs), said         back-spacer layer 14 preferably having a weight concentration of         aluminium (Al) within the range of 18%-28% and a thickness         within the range of 3-10 nm;     -   an undoped channel layer 15, formed on the back-spacer layer 14         and made of indium gallium arsenide (InGaAs), said channel layer         15 preferably having a weight concentration of indium (In)         within the range of 15%-25% and a thickness within the range of         10-20 nm;     -   an undoped spacer layer 16, formed on the channel layer 15 and         made of aluminium gallium arsenide (AlGaAs), said spacer layer         16 preferably having a weight concentration of aluminium (Al)         within the range of 18%-28% and a thickness within the range of         3-10 nm;     -   a delta doping layer 17 formed on the spacer layer 16; in         particular, said delta doping layer 17 can be undoped or doped         with a doping level greater than 0 and less than or equal to         4e¹²;     -   an undoped enhancement barrier layer 18, formed on the delta         doping layer 17 and made of gallium arsenide (GaAs) (or         aluminium gallium arsenide (AlGaAs), preferably with a weight         concentration of aluminium (Al) within the range of 18%-28%),         said enhancement barrier layer 18 preferably having a thickness         greater than 0 nm and less than or equal to 30 nm;     -   a doped first etch stopper layer 19, formed on the enhancement         barrier layer 18 and made of aluminium arsenide (AlAs), said         first etch stopper layer 19 preferably having a doping level         greater than 0 and less than or equal to 6e¹⁸, and a thickness         within the range of 1.5-2.5 nm;     -   a doped first depletion barrier layer 20, formed on the first         etch stopper layer 19 and made of gallium arsenide (GaAs) (or         aluminium gallium arsenide (AlGaAs), preferably with a weight         concentration of aluminium (Al) within the range of 18%-28%),         said first depletion barrier layer 20 preferably having a         thickness within the range of 10-30 nm and a doping level         greater than 0 and less than or equal to 6e¹⁸;     -   an undoped second depletion barrier layer 21, formed on the         first depletion barrier layer 20 and made of gallium arsenide         (GaAs) (or aluminium gallium arsenide (AlGaAs), preferably with         a weight concentration of aluminium (Al) within the range of         18%-28%), said second depletion barrier layer 21 preferably         having a thickness greater than 0 nm and less than or equal to         10 nm;     -   a doped second etch stopper layer 22, formed on the second         depletion barrier layer 21 and made of aluminium arsenide         (AlAs), said second etch stopper layer 22 preferably having a         doping level greater than 0 and less than or equal to 6e¹⁸ and a         thickness within the range of 1.5-2.5 nm;     -   a first cap layer 23 doped with n-type doping, formed on the         second etch stopper layer 22 and made of gallium arsenide         (GaAs), said first cap layer 23 preferably having a doping level         within the range of 1e¹⁷-6e¹⁷ and a thickness within the range         of 20-50 nm;     -   an undoped second cap layer 24 formed on the first cap layer 23,         said second cap layer 24 preferably having a thickness greater         than 0 nm and less than or equal to 10 nm;     -   a third etch stopper layer 25 doped with n-type doping, formed         on the second cap layer 24 and made of aluminium arsenide         (AlAs), said third etch stopper layer 25 preferably having a         doping level within the range of 1e¹⁸-6e¹⁸ and a thickness         within the range of 1.5-2.5 nm; and     -   an ohmic layer 26 doped with n-type doping, formed on the third         etch stopper layer 25 and made of gallium arsenide (GaAs), said         ohmic layer 26 preferably having a doping level within the range         of 1e¹⁸-6e¹⁸ and a thickness within the range of 30-70 nm.

Again with reference to FIG. 1, the first enhancement/depletion PHEMT device 1 also comprises:

-   -   a first region 27 in which an enhancement transistor is         manufactured, as will be described in detail below;     -   a second region 28 that is laterally spaced apart from the first         region 27 and in which a depletion transistor is manufactured,         as will be described in detail below;     -   a first pair of electrodes 29 comprising a first source         electrode and a first drain electrode arranged in the first         region 27; said first source electrode being formed on, and in         ohmic contact with, a first portion of the ohmic layer 26         extending in the first region 27 and defining a first ohmic         contact region; said first drain electrode being formed on, and         in ohmic contact with, a second portion of the ohmic layer 26         extending in the first region 27 and defining a second ohmic         contact region laterally spaced apart from the first ohmic         contact region, in particular preferably set apart at a distance         within the range of 3-6 μm; and     -   a second pair of electrodes 30 comprising a second source         electrode and a second drain electrode arranged in the second         region 28; said second source electrode being formed on, and in         ohmic contact with, a third portion of the ohmic layer 26         extending in the second region 28 and defining a third ohmic         contact region; said second drain electrode being formed on, and         in ohmic contact with, a fourth portion of the ohmic layer 26         extending in the second region 28 and defining a fourth ohmic         contact region laterally spaced apart from the third ohmic         contact region, in particular preferably set apart at a distance         within the range of 3-6 μm.

Preferably said pairs of electrodes 29 and 30 are manufactured by forming a first mask (for simplicity, not shown in FIG. 1) on the ohmic layer 26 so as to leave only the four ohmic contact regions exposed. Said first mask is conveniently formed by means of a layer of photoresist deposited on the ohmic layer 26 and patterned so as to form a respective window on each ohmic contact region. The metallizations of the source and drain electrodes are then deposited on the four ohmic contact regions through the four windows of the first mask and are subjected to an annealing treatment.

After having made the pairs of electrodes 29 and 30, the first region 27 and the second region 28 of the first enhancement/depletion PHEMT device 1 are electrically insulated through ion implantation.

In particular, again with reference to FIG. 1, a first electrical insulation barrier 31 and a second electrical insulation barrier 32 are formed by ion implantation in the layered epitaxial structure external to the first region 27 and the second region 28, respectively, so as to laterally surround, and therefore electrically insulate, said first region 27 and said second region 28, respectively.

The ion implantation is preferably carried out using a second mask (for simplicity, not shown in FIG. 1) formed on the first enhancement/depletion PHEMT device 1 so as to cover the first region 27 and the second region 28, or rather so as to leave exposed the upper surfaces of a fifth and a sixth portion of the ohmic layer 26 that extend externally to said first region 27 and to said second region 28, respectively.

Said second mask is conveniently formed by means of a layer of photoresist deposited on the first enhancement/depletion PHEMT device 1 and patterned so as to form a first opening on the upper surface of the fifth portion of the ohmic layer 26 and a second opening on the upper surface of the sixth portion of the ohmic layer 26. The ion implantation is then carried out so as to implant ions through the two openings of the second mask and into the fifth and sixth portions of the ohmic layer 26 and also into the corresponding underlying portions of all layers of the layered epitaxial structure, i.e. up to the superlattice and buffer layer 11.

With reference to FIG. 2, after having electrically insulated the first region 27 and the second region 28 of the enhancement/depletion PHEMT device 1, a first recess 33 and a second recess 34 are formed in said first region 27 and in said second region 28, respectively.

In particular, said first recess 33 is formed through a seventh portion of the ohmic layer 26 extending in the first region 27 and laterally spaced apart from the first and second portions of the ohmic layer 26, i.e. from the first and the second ohmic contact regions, and also through a first portion of the third etch stopper layer 25 extending in the first region 27 beneath said seventh portion of the ohmic layer 26, so as to leave exposed an upper surface of a first portion of the second cap layer 24 extending in the first region 27 beneath said first portion of the third etch stopper layer 25.

Furthermore, said second recess 34 is formed through an eighth portion of the ohmic layer 26 extending in the second region 28 and laterally spaced apart from the third and fourth portions of the ohmic layer 26, i.e. from the third and fourth ohmic contact regions, and also through a second portion of the third etch stopper layer 25 extending in the second region 28 beneath said eighth portion of the ohmic layer 26, so as to leave exposed an upper surface of a second portion of the second cap layer 24 extending in the second region 28 beneath said second portion of the third etch stopper layer 25.

In order to form said first recess 33 and said second recess 34, a third mask 35 is preferably formed on the first enhancement/depletion PHEMT device 1 so as to leave only the upper surfaces of the seventh and eighth portions of the ohmic layer 26 exposed.

Said third mask 35 is conveniently formed by means of a layer of photoresist deposited on the first enhancement/depletion PHEMT device 1 and patterned so as to form a first window 35 a on the upper surface of the seventh portion of the ohmic layer 26 and a second window 35 b on the upper surface of the eighth portion of the ohmic layer 26, said first window 35 a and said second window 35 b of the third mask 35 having a lateral width preferably within the range of 2-5 μm.

After having formed the third mask 35, the first recess 33 and the second recess 34 are formed by means of a first etching process, dry or wet, carried out through the first window 35 a and the second window 35 b of said third mask 35.

In particular, said first etching process, which can be carried out by means of a single chemical solution or an opportune sequence of chemical solutions, removes:

-   -   the seventh portion of the ohmic layer 26 and also the         underlying first portion of the third etch stopper layer 25,         stopping at the interface with the second cap layer 24 so as to         leave exposed the upper surface of the first portion of said         second cap layer 24 extending in the first region 27 beneath the         first portion of the third etch stopper layer 25 removed by said         first etching process; and     -   the eighth portion of the ohmic layer 26 and also the underlying         second portion of the third etch stopper layer 25, stopping at         the interface with the second cap layer 24 so as to leave         exposed the upper surface of the second portion of said second         cap layer 24 extending in the second region 28 beneath the         second portion of the third etch stopper layer 25 removed by         said first etching process.

With reference to FIG. 3, after having formed the first recess 33 and the second recess 34, a third recess 36 is formed in the first region 27.

In particular, said third recess 36 is formed through a first sub-portion of the first portion of the second cap layer 24, through a first portion of the first cap layer 23 extending in the first region 27 beneath said first sub-portion of the first portion of the second cap layer 24, and also through a first portion of the second etch stopper layer 22 extending in the first region 27 beneath said first portion of the first cap layer 23, so as to leave exposed an upper surface of a first portion of the second depletion barrier layer 21 extending in the first region 27 beneath said first portion of the second etch stopper layer 22.

In order to form said third recess 36, a fourth mask 37 is preferably formed on the first enhancement/depletion PHEMT device 1 so as to leave exposed only an upper surface of the first sub-portion of the first portion of the second cap layer 24.

Said fourth mask 37 is conveniently formed by means of a layer of photoresist deposited on the first enhancement/depletion PHEMT device 1 and patterned so as to form a window 37 a on the upper surface of the first sub-portion of the first portion of the second cap layer 24, said window 37 a of the fourth mask 37 having a lateral width preferably within the range of 0.1-0.5 μm.

After having formed the fourth mask 37, the third recess 36 is formed by means of a second etching process, dry or wet, carried out through the window 37 a of said fourth mask 37.

In particular, said second etching process, which can be carried out by means of a single chemical solution or an opportune sequence of chemical solutions, removes the first sub-portion of the first portion of the second cap layer 24, the first portion of the first cap layer 23 and also the first portion of the second etch stopper layer 22, stopping at the interface with the second depletion barrier layer 21 so as to leave exposed the upper surface of the first portion of said second depletion barrier layer 21 extending in the first region 27 beneath the first portion of the second etch stopper layer 22 removed by said second etching process.

With reference to FIG. 4, after having formed the third recess 36, said third recess 36 is widened, forming a widened third recess 36* extending in the first region 27 and a fourth recess 38 and a fifth recess 39 are simultaneously formed in the first region 27 and in the second region 28, respectively.

In particular, said widened third recess 36* is formed through a second sub-portion of the first portion of the second cap layer 24 that extends in the first region 27 and that, before said widening, laterally surrounds the third recess 36, through a second portion of the first cap layer 23 that extends in the first region 27 beneath said second sub-portion of the first portion of the second cap layer 24 and that, before said widening, laterally surrounds the third recess 36, and also through a second portion of the second etch stopper layer 22 that extends in the first region 27 beneath said second portion of the first cap layer 23 and that, before said widening, laterally surrounds the third recess 36, so as to leave exposed an upper surface of a second portion of the second depletion barrier layer 21 that extends in the first region 27 beneath said second portion of the second etch stopper layer 22, and that, before the formation of the fourth recess 38, laterally surrounds the first portion of the second depletion barrier layer 21, while, after the formation of the fourth recess 38, laterally surrounds said fourth recess 38.

Furthermore, said fourth recess 38 is formed through the first portion of the second depletion barrier layer 21, through a portion of the first depletion barrier layer 20 extending in the first region 27 beneath said first portion of the second depletion barrier layer 21, and also through a portion of the first etch stopper layer 19 extending in the first region 27 beneath said portion of the first depletion barrier layer 20, so as to leave exposed an upper surface of a portion of the enhancement barrier layer 18 that extends in the first region 27 beneath said portion of the first etch stopper layer 19 and defines a first Schottky contact region.

Furthermore, said fifth recess 39 is formed through a first sub-portion of the second portion of the second cap layer 24, through a third portion of the first cap layer 23 extending in the second region 28 beneath said first sub-portion of the second portion of the second cap layer 24, and also through a third portion of the second etch stopper layer 22 extending in the second region 28 beneath said third portion of the first cap layer 23, so as to leave exposed an upper surface of a third portion of the second depletion barrier layer 21 that extends in the second region 28 beneath said third portion of the second etch stopper layer 22 and defines a second Schottky contact region.

In order to widen said third recess 36 and to form said fourth recess 38 and said fifth recess 39, a fifth mask 40 is preferably formed on the first enhancement/depletion PHEMT device 1 so as to leave exposed only the upper surfaces of the second sub-portion of the first portion of the second cap layer 24, of the first portion of the second depletion barrier layer 21 and of the first sub-portion of the second portion of the second cap layer 24.

Said fifth mask 40 is conveniently formed by means of a layer of photoresist deposited on the first enhancement/depletion PHEMT device 1 and patterned so as to form:

-   -   a first window 40 a on the third recess 36 and the upper surface         of the second sub-portion of the first portion of the second cap         layer 24 that laterally surrounds said third recess 36; and     -   a second window 40 b on the upper surface of the first         sub-portion of the second portion of the second cap layer 24.

Preferably, said first window 40 a and said second window 40 b of the fifth mask 40 have a lateral width within the range of 0.2-0.7 μm or even greater.

After having formed the fifth mask 40, the widened third recess 36*, the fourth recess 38 and the fifth recess 39 are formed by means of a third etching process, dry or wet, carried out through the first window 40 a and the second window 40 b of said fifth mask 40.

In particular, said third etching process, which can be carried out by means of a single chemical solution or an opportune sequence of chemical solutions, removes:

-   -   the second sub-portion of the first portion of the second cap         layer 24, the second portion of the first cap layer 23 and the         second portion of the second etch stopper layer 22, stopping at         the interface with the second depletion barrier layer 21 so as         to leave exposed the upper surface of the second portion of said         second depletion barrier layer 21 extending beneath the second         portion of the second etch stopper layer 22 removed by said         third etching process;     -   the first portion of the second depletion barrier layer 21, the         underlying portion of the first depletion barrier layer 20 and         the underlying portion of the first etch stopper layer 19,         stopping at the interface with the enhancement barrier layer 18         so as to leave exposed the upper surface of the portion of said         enhancement barrier layer 18 that extends beneath the portion of         the first etch stopper layer 19 removed by said third etching         process and that defines said first Schottky contact region; and     -   the first sub-portion of the second portion of the second cap         layer 24, the third portion of the first cap layer 23 and the         third portion of the second etch stopper layer 22, stopping at         the interface with the second depletion barrier layer 21 so as         to leave exposed the upper surface of the third portion of said         second depletion barrier layer 21 that extends beneath the third         portion of the second etch stopper layer 22 removed by said         third etching process and that defines said second Schottky         contact region.

With reference to FIGS. 5 and 6, after having formed the widened third recess 36*, the fourth recess 38 and the fifth recess 39, a first gate electrode 41 and a second gate electrode 42 are formed in the first region 27 and in the second region 28, respectively, thereby making an enhancement transistor in the first region 27 and a depletion transistor in the second region 28.

In particular, said first gate electrode 41 is formed in the fourth recess 38, in the widened third recess 36* and in the first recess 33, and said second gate electrode 42 is formed in the fifth recess 39 and in the second recess 34.

In detail, the first gate electrode 41 is formed so as to comprise:

-   -   a Schottky contact portion that is formed on, and is in Schottky         contact with, said portion of the enhancement barrier layer 18         defining the first Schottky contact region, vertically extending         through all of the fourth recess 38, and can adhere or not         adhere to the lateral walls of the fourth recess 38; and     -   a field plate portion that vertically extends through all of the         widened third recess 36* and all of the first recess 33 arriving         to protrude in height from said first recess 33, laterally         extending on the upper surface of the second portion of the         second depletion barrier layer 21 that laterally surrounds the         fourth recess 38 so as to rest on and be mechanically supported         by said second portion of the second depletion barrier layer 21,         and can adhere or not adhere to the lateral walls of the widened         third recess 36*.

Furthermore, the second gate electrode 42 is formed on, and is in Schottky contact with, said third portion of the second depletion barrier layer 21 defining the second Schottky contact region, is formed so as to vertically extend through all of the fifth recess 39 and all of the second recess 34 arriving to protrude in height from said second recess 34, and can adhere or not adhere to the lateral walls of the fifth recess 39.

Preferably, as shown in FIG. 5, said gate electrodes 41 and 42 are made using the fifth mask 40.

In particular, the first gate electrode 41 is preferably made by means of chemical vapour deposition self-aligned to the first window 40 a of the fifth mask 40 and the second gate electrode 42 is preferably made by means of chemical vapour deposition self-aligned to the second window 40 b of said fifth mask 40.

FIG. 6 shows the first enhancement/depletion PHEMT device 1 comprising the enhancement transistor made in the first region 27 and the depletion transistor made in the second region 28 after removal of the fifth mask 40.

FIGS. 7 and 8 are schematic section views of a second enhancement/depletion PHEMT device made according to a second preferred embodiment of the present invention, said second enhancement/depletion PHEMT device being indicated as a whole in said FIGS. 7 and 8 by reference numeral 1′.

In particular, the second enhancement/depletion PHEMT device 1′ is made with the same manufacturing process described in relation to the first enhancement/depletion PHEMT device 1 up to the step of forming the widened third recess 36*, the fourth recess 38 and the fifth recess 39, while the step of forming the gate electrodes of the second enhancement/depletion PHEMT device 1′ is different from that previously described in relation to the enhancement/depletion PHEMT device 1.

In detail, with reference to FIGS. 7 and 8, after having formed the widened third recess 36*, the fourth recess 38 and the fifth recess 39, a first gate electrode 43 and a second gate electrode 44 of the second enhancement/depletion PHEMT device 1′ are formed in the first region 27 and in the second region 28, respectively, of the second enhancement/depletion PHEMT device 1′, thereby making an enhancement transistor in said first region 27 of the second enhancement/depletion PHEMT device 1′ and a depletion transistor in said second region 28 of the enhancement/depletion PHEMT device 1′. In particular, said first gate electrode 43 of the enhancement transistor of the second enhancement/depletion PHEMT device 1′ is formed in the fourth recess 38, in the widened third recess 36* and in the first recess 33, while said second gate electrode 44 of the depletion transistor of the second enhancement/depletion PHEMT device 1′ is formed in the fifth recess 39 and in the second recess 34.

Entering into even greater detail, the first gate electrode 43 of the enhancement transistor of the second enhancement/depletion PHEMT device 1′ is formed so as to comprise:

-   -   a respective Schottky contact portion that is formed on, and is         in Schottky contact with, said portion of the enhancement         barrier layer 18 defining the first Schottky contact region,         vertically extending through all of the fourth recess 38, and         can adhere or not adhere to the lateral walls of the fourth         recess 38; and     -   a respective field plate portion that vertically extends through         all of the widened third recess 36* and all of the first recess         33 arriving to protrude in height from said first recess 33,         laterally extending on the upper surface of the second portion         of the second depletion barrier layer 21 that laterally         surrounds the fourth recess 38 so as to rest on and be         mechanically supported by said second portion of the second         depletion barrier layer 21, also laterally extending on the         upper surface of a third sub-portion of the first portion of the         second cap layer 24 that laterally surrounds the widened third         recess 36* so as to rest on and be mechanically supported by         said third sub-portion of the first portion of the second cap         layer 24, and can adhere or not adhere to the lateral walls of         the widened third recess 36*.

Furthermore, the second gate electrode 44 of the depletion transistor of the second enhancement/depletion PHEMT device 1′ is formed so as to comprise:

-   -   a respective Schottky contact portion that is formed on, and is         in Schottky contact with, said third portion of the second         depletion barrier layer 21 defining the second Schottky contact         region, vertically extending through all of the fifth recess 39,         and can adhere or not adhere to the lateral walls of the fifth         recess 39; and     -   a respective field plate portion that vertically extends through         all of the second recess 34 arriving to protrude in height from         said second recess 34, and laterally extending on the upper         surface of a second sub-portion of the second portion of the         second cap layer 24 that laterally surrounds the fifth recess 39         so as to rest on and be mechanically supported by said second         sub-portion of the second portion of the second cap layer 24.

Preferably, as shown in FIG. 7, in order to form said gate electrodes 43 and 44 of the second enhancement/depletion PHEMT device 1′, a sixth mask 45 is formed on the second enhancement/depletion PHEMT device 1′ so as to leave exposed only the upper surfaces of the portion of the enhancement barrier layer 18 defining the first Schottky contact region, of the second portion of the second depletion barrier layer 21 that laterally surrounds the fourth recess 38, of the third sub-portion of the first portion of the second cap layer 24 that laterally surrounds the widened third recess 36*, of the third portion of the second depletion barrier layer 21 defining the second Schottky contact region and of the second sub-portion of the second portion of the second cap layer 24 that laterally surrounds the fifth recess 39.

Said sixth mask 45 is conveniently formed by means of a layer of photoresist deposited on the second enhancement/depletion PHEMT device 1′ and patterned so as to form:

-   -   a first window 45 a on the widened third recess 36* and the         upper surface of the third sub-portion of the first portion of         the second cap layer 24 that laterally surrounds said widened         third recess 36*; and     -   a second window 45 b on the fifth recess 39 and the upper         surface of the second sub-portion of the second portion of the         second cap layer 24 that laterally surrounds said fifth recess         39.

After having formed the sixth mask 45, the first gate electrode 43 of the enhancement transistor of the second enhancement/depletion PHEMT device 1′ is preferably made by means of chemical vapour deposition self-aligned to the first window 45 a of the sixth mask 45, and the second gate electrode 44 of the depletion transistor of the second enhancement/depletion PHEMT device 1′ is preferably made by means of chemical vapour deposition self-aligned to the second window 45 b of said sixth mask 45.

FIG. 8 shows the second enhancement/depletion PHEMT device 1′ comprising the enhancement transistor made in the first region 27 and the depletion transistor made in the second region 28 after removal of the sixth mask 45.

One or more embodiments of the present invention have numerous advantages.

In particular, according to an embodiment of the present invention the etch stopper layers 19, 22 and 25, which enable making the first recess 33, the second recess 34, the third recess 36, the widened third recess 36*, the fourth recess 38 and the fifth recess 39 in a controlled manner, are made of aluminium arsenide (AlAs) instead of indium gallium phosphide (InGaP) as in currently known enhancement/depletion PHEMT devices. This innovative characteristic of embodiments of the present invention ensures that the previously described manufacturing processes have high uniformity and high repeatability.

Furthermore, according to an embodiment of the present invention:

-   -   the undoped enhancement barrier layer 18 enables reducing         leakage current from the Schottky contact portions of the first         gate electrodes 41 and 43 of the enhancement transistors that         are formed on, and in Schottky contact with, said enhancement         barrier layer 18;     -   the undoped second depletion barrier layer 21 enables reducing         leakage current from the field plate portions of the first gate         electrodes 41 and 43 of the enhancement transistors that rest on         and are mechanically supported by said second depletion barrier         layer 21;     -   the undoped second depletion barrier layer 21 enables reducing         leakage current from the Schottky contact portions of the second         gate electrodes 42 and 44 of the depletion transistors that are         formed on, and in Schottky contact with, said second depletion         barrier layer 21; and     -   the undoped second cap layer 24 enables reducing leakage current         from the field plate portions of the first gate electrode 43 and         of the second gate electrode 44 of the second         enhancement/depletion PHEMT device 1′ that rest on and are         mechanically supported by said second cap layer 24.

In addition, the layered epitaxial structure and the manufacturing processes according to the present invention enable preventing the aluminium-based layers from being exposed to air, so as to reduce the phenomena of current breakdown often observed when aluminium-based layers are exposed to air.

Furthermore, the enhancement barrier layer 18, the first depletion barrier layer 20, the second depletion barrier layer 21, the first cap layer 23, the second cap layer 24 and the ohmic layer 26 made, according to a preferred embodiment of the present invention, in gallium arsenide (GaAs) instead of aluminium gallium arsenide (AlGaAs) as in currently known enhancement/depletion PHEMT devices enables obtaining a lower barrier for the electrons that flow between the source and drain contacts in the enhancement transistor channel and in the depletion transistor channel.

Finally, the manufacturing of the field plate portions of the gate electrodes enables reducing the output conductance of the enhancement transistors and the depletion transistors, said output conductance representing a critical factor for the performance of digital circuits. 

1. A layered epitaxial structure for enhancement and depletion PHEMT devices, comprising: a superlattice and buffer layer; an undoped back-barrier layer formed on the superlattice and buffer layer and made of aluminium gallium arsenide (AlGaAs); a doped back delta doping layer formed on the back-barrier layer; an undoped back-spacer layer formed on the back delta doping layer and made of aluminium gallium arsenide (AlGaAs); an undoped channel layer formed on the back-spacer layer and made of indium gallium arsenide (InGaAs); an undoped spacer layer formed on the channel layer and made of aluminium gallium arsenide (AlGaAs); a delta doping layer formed on the spacer layer; an undoped enhancement barrier layer formed on the delta doping layer; a doped first etch stopper layer, formed on the enhancement barrier layer and made of aluminium arsenide (AlAs); a doped first depletion barrier layer formed on the first etch stopper layer; an undoped second depletion barrier layer formed on the first depletion barrier layer; a doped second etch stopper layer formed on the second depletion barrier layer and made of aluminium arsenide (AlAs); a first cap layer doped with n-type doping, formed on the second etch stopper layer and made of gallium arsenide (GaAs); an undoped second cap layer formed on the first cap layer and made of gallium arsenide (GaAs); a third etch stopper layer doped with n-type doping, formed on the second cap layer and made of aluminium arsenide (AlAs); and an ohmic layer doped with n-type doping, formed on the third etch stopper layer and made of gallium arsenide (GaAs).
 2. The layered epitaxial structure of claim 1, wherein the enhancement barrier layer, the first depletion barrier layer and the second depletion barrier layer are made of gallium arsenide (GaAs).
 3. An enhancement/depletion PHEMT device comprising: the layered epitaxial structure claimed in claim 1; a first region comprising: a first recess vertically formed through the ohmic layer and the third etch stopper layer so as to expose a first upper surface of the second cap layer, a second recess that is narrower than the first recess and which vertically extends from the first recess through the second cap layer, the first cap layer and the second etch stopper layer so as to expose a first upper surface of the second depletion barrier layer, and a third recess that is narrower than the second recess and which vertically extends from the second recess through the second depletion barrier layer, the first depletion barrier layer and the first etch stopper layer so as to expose an upper surface of the enhancement barrier layer defining a first Schottky contact region; a second region laterally spaced apart, and electrically insulated, from the first region and comprising: a fourth recess vertically formed through the ohmic layer and the third etch stopper layer so as to expose a second upper surface of the second cap layer, and a fifth recess that is narrower than the fourth recess and which vertically extends from the fourth recess through the second cap layer, the first cap layer and the second etch stopper layer so as to expose a second upper surface of the second depletion barrier layer defining a second Schottky contact region; an enhancement transistor formed in the first region and comprising: first source and drain electrodes formed on, and in ohmic contact with, the ohmic layer in the first region externally to the first recess, and a first gate electrode formed in the third recess in Schottky contact with the upper surface of the enhancement barrier layer defining the first Schottky contact region and extending vertically from the first Schottky contact region through the third, the second and the first recess so as to protrude from the first recess; and a depletion transistor formed in the second region and comprising: second source and drain electrodes formed on, and in ohmic contact with, the ohmic layer in the second region externally to the fourth recess, and a second gate electrode formed in the fifth recess in Schottky contact with the second upper surface of the second depletion barrier layer defining the second Schottky contact region and extending vertically from the second Schottky contact region through the fifth and the fourth recess so as to protrude from the fourth recess.
 4. The enhancement/depletion PHEMT device of claim 3, wherein the first gate electrode comprises a field plate portion that laterally extends in the second recess on the first upper surface of the second depletion barrier layer so as to rest on and be mechanically supported by the first upper surface of the second depletion barrier layer.
 5. The enhancement/depletion PHEMT device of claim 4, wherein the field plate portion of the first gate electrode laterally extends in the first recess on a portion of the first upper surface of the second cap layer so as to rest on and be mechanically supported by the portion of the first upper surface of the second cap layer.
 6. The enhancement/depletion PHEMT device according to claim 3, wherein the second gate electrode comprises a field plate portion that laterally extends in the fourth recess on a portion of the second upper surface of the second cap layer so as to rest on and be mechanically supported by the portion of the second upper surface of the second cap layer.
 7. A method of manufacturing an enhancement/depletion PHEMT device, comprising: providing a layered epitaxial structure that includes: a superlattice and buffer layer, an undoped back-barrier layer formed on the superlattice and buffer layer and made of aluminium gallium arsenide (AlGaAs), a doped back delta doping layer formed on the back-barrier layer, an undoped back-spacer layer formed on the back delta doping layer and made of aluminium gallium arsenide (AlGaAs), an undoped channel layer formed on the back-spacer layer and made of indium gallium arsenide (InGaAs), an undoped spacer layer formed on the channel layer and made of aluminium gallium arsenide (AlGaAs), a delta doping layer formed on the spacer layer, an undoped enhancement barrier layer formed on the delta doping layer, a doped first etch stopper layer formed on the enhancement barrier layer and made of aluminium arsenide (AlAs), a doped first depletion barrier layer formed on the first etch stopper layer, an undoped second depletion barrier layer formed on the first depletion barrier layer, a doped second etch stopper layer formed on the second depletion barrier layer and made of aluminium arsenide (AlAs), a first cap layer doped with n-type doping, formed on the second etch stopper layer and made of gallium arsenide (GaAs), an undoped second cap layer formed on the first cap layer and made of gallium arsenide (GaAs), a third etch stopper layer doped with n-type doping, formed on the second cap layer and made of aluminium arsenide (AlAs), and a ohmic layer doped with n-type doping, formed on the third etch stopper layer and made of gallium arsenide (GaAs); forming a first pair of electrodes of an enhancement transistor on, and in ohmic contact with, the ohmic layer in a first region of the layered epitaxial structure and a second pair of electrodes of a depletion transistor on, and in ohmic contact with, the ohmic layer in a second region of the layered epitaxial structure laterally spaced apart from the first region, the first pair of electrodes comprising a first source electrode and a first drain electrode, the second pair of electrodes comprising a second source electrode and a second drain electrode; electrically insulating the first region and the second region; forming, in the first region, a first recess that is laterally spaced apart from the first pair of electrodes and which vertically extends through the ohmic layer and the third etch stopper layer so as to expose a first upper surface of the second cap layer, and in the second region, a second recess that is laterally spaced apart from the second pair of electrodes and which vertically extends through the ohmic layer and the third etch stopper layer so as to expose a second upper surface of the second cap layer; forming, in the first region, a third recess that is narrower than the first recess and which vertically extends from the first recess through the second cap layer, the first cap layer and the second etch stopper layer so as to expose a first upper surface of the second depletion barrier layer, in the first region, a fourth recess that is narrower than the third recess and which vertically extends from the third recess through the second depletion barrier layer, the first depletion barrier layer and the first etch stopper layer so as to expose an upper surface of the enhancement barrier layer defining a first Schottky contact region, and in the second region, a fifth recess that is narrower than the second recess and which vertically extends from the second recess through the second cap layer, the first cap layer and the second etch stopper layer so as to expose a second upper surface of the second depletion barrier layer defining a second Schottky contact region; and forming, in the fourth recess, a first gate electrode of the enhancement transistor in Schottky contact with the upper surface of the enhancement barrier layer defining the first Schottky contact region, the first gate electrode vertically extending from the first Schottky contact region through the fourth, the third and the first recess so as to protrude from the first recess, and in the fifth recess, a second gate electrode of the depletion transistor in Schottky contact with the second upper surface of the second depletion barrier layer defining the second Schottky contact region, the second gate electrode vertically extending from the second Schottky contact region through the fifth and the second recess so as to protrude from the second recess.
 8. The method of claim 7, wherein forming the third recess, the fourth recess and the fifth recess comprises: forming a third recess by means of a first etching process carried out by using a first mask formed on the layered epitaxial structure, on the first pair of electrodes and on the second pair of electrodes so as to expose a first portion of the first upper surface of the second cap layer to the first etching process; and widening the third recess and forming the fourth recess and the fifth recess by means of a second etching process carried out by using a second mask formed on the layered epitaxial structure, on the first pair of electrodes and on the second pair of electrodes so as to expose the third recess, a second portion of the first upper surface of the second cap layer laterally extending from the third recess and a first portion of the second upper surface of the second cap layer to the second etching process.
 9. The method of claim 8, wherein the first gate electrode and the second gate electrode are formed by means of chemical vapour deposition carried out by using the second mask.
 10. The method of claim 8, wherein the first gate electrode and the second gate electrode are formed by means of chemical vapour deposition carried out by using a third mask formed on the layered epitaxial structure, on the first pair of electrodes and on the second pair of electrodes so as to expose the fourth recess, the widened third recess, a third portion of the first upper surface of the second cap layer laterally extending from the widened third recess, the fifth recess and a second portion of the second upper surface of the second cap layer laterally extending from the fifth recess to the chemical vapour deposition.
 11. The method according to claim 7, wherein electrically insulating the first region and the second region comprises forming by ionic implantation: a first electrical insulation barrier surrounding the first region and vertically extending through all the layers of the layered epitaxial structure; and a second electrical insulation barrier surrounding the second region and vertically extending through all the layers of the layered epitaxial structure. 